PRODUCT01
More than 100 units are in operation at semiconductor industry Fabs and QA labs around the world.
This is an innovative pretreatment system connected with ICP-MS to achieve fully automated analysis of metal impurities in Si wafers and others. PS, FAB and LAB models are available and they can also be custom-made to meet your specific purpose.
PRODUCT02
This is a system that automatically and continuously monitors metallic impurities in chemical solutions at ppt levels at even long-distance sampling points without any human intervention.
PRODUCT03
This system automatically adds standard solutions online for ICP-MS analysis, and is applicable to both the external calibration method and the method of standard addition.
PRODUCT04
This is an introduction system that enables direct introduction of gas samples into ICP-MS, for its direct analysis of their metallic particles.
PRODUCT05
This system is capable of introducing a very small amount of standard solution into ICP-MS plasma with 100% efficiency.
It is ideal for the determination of impurities in gas samples and the measurement of particle size distribution of particulate metals.
Company name | IAS Inc. |
---|---|
Established | December/9/2004 |
Capital | 90 million yen |
President | Katsuhiko Kawabata |
Head office | 2-2-1 Hinohonmachi, Hino, Tokyo 191-0011, Japan |
TEL | +81-42-589-5525 |
Business details | Manufacture and sales of ICP-OES/ICP-MS parts, peripherals, and pretreatment devices, etc. |