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Gaseous Sample Introduction System (GED・GPD)
The GED・GPD system is used as a sample introduction device of ICP-MS or ICP-OES. When a sample gas that contains metallic particles is introduced to the GED, a sample gas is exchanged with Ar gas in the GED while metallic particles are not exchanged. As a result, metallic particles come out from the GED in Ar gas stream, which is introduced to the plasma of ICP and analyzed.
●Features and Applications
- GED uses a very special membrane tube and a sample gas is introduced to the inner side of membrane tube and an Ar sweep gas is introduced to the outer side of membrane tube. The sample gas and Ar gas permeate each other through the membrane and are effectively exchanged. The concentration of Ar gas from inside the membrane at the outlet of GED becomes more than 99.99%. Metallic particles contained in the sample gas doesn’t permeate the membrane and come out from GED in Ar gas stream and are introduced to ICP-MS or ICP-OES
- Gaseous compounds such as AsH3, PH3, GeH4, SiH4, SbH3, Hg can be converted to oxide particles by using GPD, and the combination with GED can analyze these compounds.
- Particulate Hg in environmental air can be detected by GED-ICP-MS, and gaseous Hg can also be continuously measured by GPD-GED-ICP-MS.
- Metallic impurities in mainstream and sidestream in tobacco can be analyzed.
- Laser Ablation ICP-MS has been commonly used for direct analysis of solid samples. However, a solid sample should be placed inside a small cell and a mixture of Ar and He carries generated particles to ICP-MS, so there is limitation of sample size. When LA-GED-ICP-MS is used, a sample can be ablated in open air, which eliminates limitation of sample size.
- GED-ICP-MS can measure various gases used in the semiconductor industry. The current technique to determine metallic impurities in gases is to use a bubbling technique or a filtration technique. Both techniques need preparation time before analysis by ICP-MS and samples are diluted. As a result, it is difficult to determine a single ppt level of impurities. When GED-ICP-MS is used, these gases can be directly analyzed at a single ppq level.
- GED-01 (standard GED unit)

This model can introduce 250 mL/min of environmental air sample.

- GEDQ-01 (High volume GED unit)

This model can introduce 800 mL/min of gas samples, which increases the sensitivity compared with the standard model.

- MSGG-01 (Metal Standard Gas Generation Unit)

Around a few hundred ppt of metallic gas standard is generated. It is very useful tool for tuning of ICP-MS. Three metallic standard gases are available.

- N2U-01 (Nitrogen Addition Unit)

Small amount of N2 gas can be introduced to ICP-MS, which enhances the sensitivity of ICP-MS depending on a purity of Ar gas.

- GPD-01 (Gas Particulatin Unit)

This unit can convert gaseous compounds to oxide particles. Gaseous compounds such as AsH3, PH3, GeH4, SiH4, SbH3, Hg can be converted to oxide, which can be analyzed by GED-ICP-MS.

VPD system | Online system | ASAS | GPD・GED