IAS Inc.
International Analytical Solutions
PRODUCT01
Expert™ :
Auto Scanning System - Fully Automated VPD-ICP-MS
More than 100 units are in operation at semiconductor industry Fabs and QA labs around the world.
This is an innovative pretreatment system connected with ICP-MS to achieve fully automated analysis of metal impurities in Si wafers and others. PS, FAB and LAB models are available and they can also be custom-made to meet your specific purpose.
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PRODUCT02
LAGM™ :
LaserAblation-GED- MSAG system
The new LA-ICP-MS system that could overcome two major issues on the conventional LA-IC-MS systems.
■Direct Analysis without Cutting Wafers
The conventional LA-ICP-MS system needs to use a small enclosed cell in which a small solid sample is placed.
LAGM doesn’t require the small enclosed cell. A solid sample is laser ablated under particle free environment, and generated particles are aspirated together with clean air by an ejector, which are introduced to the plasma of ICP-MS via GED (Gas Exchange Device).
■Superior Quantitation Capability
Another issue of the conventional LA-ICP-MS is the quantitation. Solid standard reference materials (SRMs) are commonly used, but the particle amount generated from a solid sample and the SRMs would be different, which makes difficult to perform accurate quantitation.
LAGM uses the MSAG_DS that injects a few μL/min of mixed standard solution that are vaporized and introduced to the plasma of ICP-MS almost 100%. As a result, the method of standard addition or internal standard can be used while laser ablating a solid sample, which allows accurate quantitation.
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PRODUCT03
CSI : Online Monitoring System
This is a system that automatically and continuously monitors metallic impurities in chemical solutions at ppt levels at even long-distance sampling points without any human intervention.
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PRODUCT04
ASAS II :
Automated Standard Addition System
This system automatically adds standard solutions online for ICP-MS analysis, and is applicable to both the external calibration method and the method of standard addition.
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PRODUCT05
ASDM™ :
Autosampler with Dilution Module
Dilution of chemical solution is needed to avoid damage on ICP-MS cones. ASDM dilutes chemicals by 2 –1,000 times, and the diluted chemical can be analyzed by the method of standard addition with ASAS II automatically.
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PRODUCT06
GED : Gas Exchange Device
This is an introduction system that enables direct introduction of gas samples into ICP-MS, for its direct analysis of their metallic particles.
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PRODUCT07
MSAG :
Metal Standard Aerosol Generation
This system is capable of introducing a very small amount of standard solution into ICP-MS plasma with 100% efficiency.
It is ideal for the determination of impurities in gas samples and the measurement of particle size distribution of particulate metals.
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■ Corporate Information
| Company name | IAS Inc． |
|---|---|
| Established | December/9/2004 |
| Capital | 90 million yen |
| President | Katsuhiko Kawabata |
| Head office | 2-2-1 Hinohonmachi, Hino, Tokyo 191-0011, Japan |
| TEL | +81-42-589-5525 |
| Business details | Manufacture and sales of ICP-OES/ICP-MS parts, peripherals, and pretreatment devices, etc. |